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Simple Fabrication of Molecular Circuits by Shadow Mask Evaporation

机译:通过荫罩蒸发简单制造分子电路

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摘要

We fabricate contacts to molecular circuits by evaporating metal through a nanoscale stencil mask etched in a free-standing silicon nitride membrane. In this way, contacts can be fabricated on as-grown molecular wires that would be contaminated or destroyed by chemicals and heat treatments associated with conventional lithographic techniques. Chemical vapor deposition-grown single-walled carbon nanotubes contacted in this fashion behave similarly to samples contacted using conventional lithography but are more robust to failure at high bias. In-vacuum electrical measurements of λ-DNA networks on mica substrates contacted in a "leads-on-top" geometry give a lower bound of 1000 TΩ for the resistance of a 1-μm length of DNA.
机译:我们通过在独立氮化硅膜上蚀刻的纳米级模板掩模蒸发金属来制造与分子电路的接触。以此方式,可以在生长的分子线上制造触点,该分子线上会被与传统光刻技术相关的化学物质和热处理污染或破坏。以这种方式接触的化学气相沉积生长的单壁碳纳米管的行为与使用常规光刻技术接触的样品相似,但对高偏压下的破坏更稳定。以“顶部引线”几何形状接触的云母基板上的λ-DNA网络的真空电学测量结果,对于1-μm长度的DNA的电阻,其下限为1000TΩ。

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