Inheritance and RAPD Marker Selection Linked to Resistance Trait of Alternaria Blotch (A. mali) in Apples

摘要

To clarify inheritance mode and to develop molecular markers linked to the resistance trait of Alternaria blotch (A. mali) in apple, the 100 seedlings were evaluated and genetically analyzed from the F] progeny population between resistant 'Tsugaru' and susceptible 'Gamhong'. The results of the field evaluation showed 1:1 segregation between resistant and susceptible seedlings confirming that the resistance of Alternaria blotch is controlled by single recessive gene. Inoculation using 4 x diluted culture filtrate was useful for screening of resistance because the 4 x dilution only fitted an expecting 1:1 segregation ratio among four different dilution ratios of culture filtrate. More seedlings of resistance were segregated by culture filtrate inoculation originated with two kinds of A. mali than those by field evaluation which result proposed the influence of major gene(s) to the Alternaria blotch resistance in apples. As a result of bulked segregant analysis (BSA) using 567 random primers, 27 random amplified polymorphic DNA (RAPD) markers were preliminarily selected using two parents and two DNA bulks and three RAPD markers linked to the Alternaria blotch resistance trait, OPV03-1390, OPU06-1270, and WK07-1580, were finally selected. The resultssuggest that the selected markers could be used for the resistant apple breeding to increase selection efficiency.