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Admittance spectroscopic analysis of polymer light emitting diodes with the LiF cathode buffer layer

机译:具有LiF阴极缓冲层的聚合物发光二极管的导纳光谱分析

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Admittance Spectroscopic analysis was applied to study the effect of LiF buffer layer and to model the equivalent circuit for poly(2-methoxy-5-(2'-ethylhexyloxy)-1,4-phenylenevinylene) (MEH-PPV)-based polymer light emitting diodes (PLEDs) with the LiF cathode buffer layer. The single layer device with ITO/MEH-PPV/Al structure can be modeled as a simple combination of two resistors and a capacitor. Insertion of a LiF layer at the Al/MEH-PPV interface shifts the lowest unoccupied molecular orbital (LUMO) level and the vacuum level of the MEH-PPV layer as a result of which the barrier height for electron injection at the Al/MEH-PPV interface is reduced. The admittance spectroscopic analysis of the devices with the LiF cathode buffer layer shows reduction in contact resistance (R-C), parallel resistance (R-P) and increment in parallel capacitance (C-P).
机译:导纳光谱分析用于研究LiF缓冲层的作用并为基于聚(2-甲氧基-5-(2'-乙基己氧基)-1,4-亚苯基亚乙烯基)(MEH-PPV)的聚合物光的等效电路建模LiF阴极缓冲层的发光二极管(PLED)。具有ITO / MEH-PPV / Al结构的单层设备可以建模为两个电阻和一个电容器的简单组合。在Al / MEH-PPV界面处插入LiF层会移动最低的未占据分子轨道(LUMO)能级和MEH-PPV层的真空能级,因此,在Al / MEH- PPV接口减少。具有LiF阴极缓冲层的器件的导纳光谱分析表明,接触电阻(R-C),并联电阻(R-P)和并联电容(C-P)减小。

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