Fabrication of Step-Formed PDP Barrier Ribs with High Aspect Ratio by X-Ray Lithography

摘要

X-ray lithography has been used widely for the fabrication of nano/micro structures. This process was applied to the fabrication of barrier ribs with a high aspect ratio for plasma display panel (PDP). The design of X-ray mask and X-ray exposure process were optimized to fabricate highly precise barrier rib pattern for PDP.