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Simulations on nanotribological properties of molecular deposition films

机译:分子沉积膜的纳米摩擦学特性模拟

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The nanotribological properties of molecular deposition films deposited on an Au substrate are studied theoretically for the first time. First, the structure and potential parameters of the molecular deposition film are calculated using quantum mechanics. Second, the film deposited on the Au (111) substrate after interaction with an Au tip is simulated by molecular dynamics simulations. It is found that in the process of compression the tilt angle and the potential energy of the molecules in the film near the tip both increase as the distance between the tip and film decreases. in the scan process, first a continuous slip and afterwards regular stick-slip occur; this is in agreement with the spatial structure.
机译:理论上首次研究了沉积在金基底上的分子沉积膜的纳米摩擦学性质。首先,使用量子力学计算分子沉积膜的结构和电势参数。其次,通过分子动力学模拟来模拟与Au尖端相互作用后沉积在Au(111)衬底上的薄膜。发现在压缩过程中,随着尖端和膜之间的距离减小,在尖端附近的膜中的分子的倾斜角和势能都增加。在扫描过程中,首先发生连续滑移,然后发生规则的粘滑。这与空间结构是一致的。

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