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Analysis of the standard deviation of surface potential fluctuations in MOS interface from DLTS spectra

机译:从DLTS光谱分析MOS界面中表面电势波动的标准偏差

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The surface potential fluctuations can have significant effects on both the magnitude and shape of the measured small-pulse DLTS spectrum. An increase in the dispersion parameter sigma(S) of the surface potential distribution, which is assumed to have a Gaussian form, leads to a reduction in the DLTS signal size, a shift of the peak position and a broadening of the peak shape. A computer program including the exponential temperature dependence of hole capture cross section, sigma(P) = sigma(0) exp(-Delta E-sigma/kT), was developed to analyse temperature-scan DLTS spectra of a MOS structure; in the evaluation procedure sigma(S), sigma(0) and Delta E-sigma are taken as fitting parameters. A bias dependence of sigma(S) has been found and an interpretation of this behaviour has been attempted in the light of random point charges (Brews) and patchwork (Nicollian-Goetzberger) models. [References: 26]
机译:表面电势波动可能对测得的小脉冲DLTS频谱的大小和形状都有重大影响。假定具有高斯形式的表面电势分布的色散参数sigma(S)增大,将导致DLTS信号大小减小,峰位置偏移和峰形状变宽。开发了包含空穴捕获横截面的指数温度依赖性sigma(P)= sigma(0)exp(-Delta E-sigma / kT)的计算机程序,以分析MOS结构的温度扫描DLTS光谱;在评估程序中,将sigma(S),sigma(0)和Delta E-sigma作为拟合参数。已经发现了西格玛(S)的偏差依赖性,并且已经根据随机点电荷(Brews)和拼凑(Nicollian-Goetzberger)模型尝试了对此行为的解释。 [参考:26]

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