首页> 外文期刊>Modern Physics Letters, B. Condensed Matter Physics, Statistical Physics, Applied Physics >Fabrication and characterization of La_(2-x)Sr_xCuO _4/Nb-SrTiO_3 heterojunctions in different doped regimes
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Fabrication and characterization of La_(2-x)Sr_xCuO _4/Nb-SrTiO_3 heterojunctions in different doped regimes

机译:不同掺杂状态下La_(2-x)Sr_xCuO_4 / Nb-SrTiO_3异质结的制备与表征

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摘要

Two types of p-n junction were fabricated by depositing underdoped La _(1.9)Sr_(0.1)CuO_4 film and overdoped La _(1.8)Sr_(0.2)CuO_4 film on n-type 0.5 wt.% Nb-doped SrTiO_3 (NSTO) substrates using pulsed laser deposition technique (PLD), respectively. Current-voltage (I-V) characteristics of the La _(2-x)Sr_xCuO_4/NSTO heterojunction were measured in the temperature range from 5 K to 300 K. All I-V curves show a fine rectifying property and a visible reduction of the diffusion potential (V_d) is observed, but the behaviors of V_d are vastly different for the underdoped and overdoped regimes at temperatures below T_c. Analysis results show that the characteristics of the heterojunction are possibly affected not only by the superconducting gap of LSCO at T_c, but also by the depletion layer in the interface of LSCO/NSTO junction. The variation of the depletion layer is possibly different under the same applied bias voltages for the underdoped La_(1.9)Sr_(0.1)CuO_4/NSTO junction and overdoped La_(1.8)Sr_(0.2)CuO_4/NSTO junction due to the difference of carrier density at La_(1.9)Sr _(0.1)CuO_4 and La_(1.8)Sr_(0.2)CuO _4.
机译:通过在n型0.5重量%掺Nb的SrTiO_3(NSTO)衬底上沉积掺杂不足的La _(1.9)Sr_(0.1)CuO_4膜和掺杂过量的La _(1.8)Sr_(0.2)CuO_4膜来制造两种类型的pn结。分别使用脉冲激光沉积技术(PLD)。在5 K至300 K的温度范围内测量了La _(2-x)Sr_xCuO_4 / NSTO异质结的电流-电压(IV)特性。所有IV曲线均显示出良好的整流性能和可见的扩散电位降低(观察到V_d),但是在低于T_c的温度下,对于掺杂不足和掺杂过量的区域,V_d的行为差异很大。分析结果表明,异质结的特性不仅可能受到T_c处的LSCO的超导间隙的影响,而且还可能受到LSCO / NSTO结界面处的耗尽层的影响。由于载流子的不同,对于掺杂不足的La_(1.9)Sr_(0.1)CuO_4 / NSTO结和掺杂过量的La_(1.8)Sr_(0.2)CuO_4 / NSTO结,在相同的施加偏置电压下,耗尽层的变化可能会有所不同La_(1.9)Sr_(0.1)CuO_4和La_(1.8)Sr_(0.2)CuO_4时的密度。

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