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A geometric approach to dislocation densities in semiconductors*

机译:半导体中位错密度的几何方法*

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摘要

Dislocation densities threading semiconductor crystals are a problem for device developers. Among the issues presented by the defect density is the appearance of the so-called shallow levels. In this work, we introduce a geometric model to explain the origin of the observed shallow levels. We show that a uniform distribution of screw dislocations acts as an effective uniform magnetic field which yields electronic bound states even in the presence of a repulsive Coulomb-like potential. This introduces energy levels within the band gap, increasing the carrier concentration in the region threaded by the dislocation density and adding additional recombination paths other than the near band-edge recombination. Our results suggest that one might use a magnetic field to destroy the dislocation density bound states and therefore minimize its effects on the charge carriers.
机译:半导体晶体的位错密度是器件开发人员面临的一个问题。缺陷密度带来的问题之一就是所谓浅层的出现。在这项工作中,我们引入了一个几何模型来解释观察到的浅层水平的起源。我们表明,螺丝位错的均匀分布可充当有效的均匀磁场,即使在存在排斥性库仑势的情况下,也能产生电子束缚态。这在带隙内引入了能级,从而增加了由位错密度穿过的区域中的载流子浓度,并增加了除近带边复合以外的其他复合路径。我们的结果表明,人们可能会使用磁场破坏位错密度的束缚态,从而最大程度地降低其对电荷载流子的影响。

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