首页> 外文期刊>Modern Physics Letters, B. Condensed Matter Physics, Statistical Physics, Applied Physics >Enhancing micro-electromechanical and tuning optical properties in Nd-doped BIT thin film
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Enhancing micro-electromechanical and tuning optical properties in Nd-doped BIT thin film

机译:增强Nd掺杂BIT薄膜的微机电性能和调谐光学性能

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摘要

Bi4Ti3O12 (BIT) and Bi3.25Nd0.75Ti3O12 (BNT) thin films were deposited on Pt/Ti/SiO2/Si (100) substrates using pulsed laser deposition. The surface morphologies, ferroelectric domain structures and polarization switching were investigated by atomic force microscopy (AFM) and piezoelectric force microscopy (PFM). The phase and amplitude images of PFM show that the BIT and BNT thin films have clear domain structures. Comparison of the surface morphologies and domain structures indicates that the grain boundaries limit the shape of domain and affect the domain structure. The micro-electromechanical performance was characterized by the effective piezoelectric coefficient d(33,f) of the thin films. The result shows that the maximum effective d(33,f) value (100 pm/V) of BNT thin film is larger than that of BIT thin film (30 pm/V). This can be ascribed to BNT thin film with a preferred growth direction of a-axis, resulting in effective enhancement of d(33,f). Besides, all the thin films exhibit good optical transmittance in the range of 500-800 nm and the optical band gaps increase from 3.43 eV to 3.52 eV due to Nd doping.
机译:使用脉冲激光沉积将Bi4Ti3O12(BIT)和Bi3.25Nd0.75Ti3O12(BNT)薄膜沉积在Pt / Ti / SiO2 / Si(100)衬底上。通过原子力显微镜(AFM)和压电力显微镜(PFM)研究了表面形貌,铁电畴结构和极化转换。 PFM的相位和幅度图像表明BIT和BNT薄膜具有清晰的畴结构。表面形态和畴结构的比较表明,晶界限制了畴的形状并影响了畴结构。微机电性能的特征在于薄膜的有效压电系数d(33,f)。结果表明,BNT薄膜的最大有效d(33,f)值(100 pm / V)大于BIT薄膜的最大有效d(33 pm / V)(30 pm / V)。这可以归因于具有优选的a轴生长方向的BNT薄膜,导致d(33,f)的有效增强。此外,所有薄膜均在500-800 nm范围内表现出良好的透光率,并且由于Nd掺杂,带隙从3.43 eV增加到3.52 eV。

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