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Study on Ferroelectric Properties of Nd-Doped Bi{sub}4Ti{sub}3O{sub}12 Thin Films Prepared by Sol-Gel Method

机译:溶胶 - 凝胶法制备Nd-掺杂Bi {Sub} 4TI {Sub} 3O {Sub} 12的铁电性能研究

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Nd-doped bismuth titanate Bi{sub}(4-x)Nd{sub}xTi{sub}3O{sub}12 (BNT) thin films were fabricated on Pt/Ti/SiO{sub}2/Si substrates by sol-gel method and spin-coating technique. The structures and the ferroelectric properties of the films were investigated. Nd doping leads to a marked improvement in the remanent polarization (P{sub}r) and the coercive field (E{sub}c). At the applied electric field of 260 kV/cm, P{sub}r and E{sub}c of the BNT film with x=0.5 annealed at 650°C are 19 μC/cm{sup}2 and 135 kV/cm, respectively. Moreover, the BNT film with x=0.5 showed a fatiguefree behavior up to 3×10{sup}10 read/write cycles.
机译:钛酸铋Bi {sub}(4-x)Nd {sub} xti {sub} 3o {sub} 12(bnt)薄膜通过溶解在Pt / ti / siO {sub} 2 / si基板上制造凝胶法和旋涂技术。研究了薄膜的结构和铁电性能。 ND掺杂导致倒置极化(P {Sub} R)和矫顽字段(E {Sub} C)的显着改善。在260kV / cm的施加电场,具有x = 0.5的Bnt膜的P {sub} R和e {sub} c在650℃下退火为19μc/ cm {sup} 2和135kv / cm,分别。此外,具有X = 0.5的BNT膜显示出高达3×10 {SUP} 10读/写周期的疲劳过度行为。

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