Fabrication of antiscatter grids and collimators for X-ray and gamma-ray imaging by lithography and electroforming

摘要

Creatv MicroTech has developed unique fabrication techniques to make high precision, high-aspect-ratio metal microstructures to custom specifications. A lithography based fabrication method permits precise fabrication of various microstructures. Collimators and antiscatter grids with continuous, smooth, thin, parallel or focused septa have been fabricated using deep X-ray and optical lithography, combined with metal electroforming. Microfabrication of high-aspect-ratio structures, especially of relatively large areas, presents many challenges: specialized mask design and X-ray mask fabrication; resist preparation, optimal exposure parameters, post-exposure processing, electroforming, polishing, and final assembly. Here, we present microstructures of various designs that we fabricated and describe the challenges that had to be overcome.