Wet etching of silicon gratings with triangular profiles

摘要

Triangular silicon gratings of different size (periods from 0.8 to 25.0 μm) are manufactured by wet chemical etching. Two main principles of preparation are used and improved. The received gratings are investigated and characterized by SEM concerning the uniformity and the sharpness of the convex edges and the concave notches. Their very small radii determined by TEM are reported for the first time. The gratings can be applied to optical purposes or as standards for surface metrology.