The Lithography Expert: Line-edge roughness, Part 1

摘要

While resolution is commonly discussed relative to optical limits, and sometimes even resist contrast limitations, it is quite possible that the ultimate limit of resolution will come from line-edge roughness (LER). When variations in the width of a resist feature occur quickly over the length of the feature, this variation is called linewidth roughness (see photo). When examining these variations along just one edge, it is called LER.