The present paper attempt to make an as completely literature review that emphasise the main features of TaN thin films, namely the structure of these films deposited by different methods. Tantalum nitride thin films captured our attention with its wide area of application in industry and technology and its remarkable properties. Most of the reported work aims micro-electronic application of these coatings deposited by different techniques: chemical laserdeposition, atomic layer deposition, ion beam assisted deposition, reactive electron-beam evaporation, chemical vapour deposition. However reactive sputter deposition seems to be preferred. Because variations in stoichiomeiry are common about TaN thin films the properties of the coatings are highly influenced by the deposition parameters. For example, relatively low nitrogen can promote the formation of cubic-structure.
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