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Effect of pressure on the sorption correction to stainless steel, platinum/iridium and silicon mass artefacts

机译:压力对不锈钢,铂/铱和硅质量伪像的吸附校正的影响

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摘要

This paper reports work undertaken to evaluate the change in mass of platinum/iridium, stainless steel and silicon artefacts measured at atmospheric pressure and in vacuum at a range of pressures typical of those used in vacuum mass comparators and watt balances and for x-ray crystal density (XRCD) measurements. The sets of platinum/iridium, stainless steel and silicon artefacts used in this work have different surface areas and the effect of transferring them between atmospheric pressure and different levels of vacuum was evaluated by measuring the relative changes in mass between them. Reversible variations in the mass differences between the artefacts were found over the pressure range from 0.1 Pa to 100 000 Pa (atmospheric pressure). At lower pressures (0.001 Pa to 0.1 Pa) the mass differences between all the artefacts were stable and no evidence for hysteresis over this range was found when going down in pressure compared with increasing pressure. Therefore consistent results between watt balance, XRCD measurements and vacuum mass measurements can be realized providing the measurements are performed within this pressure range.
机译:本文报告了为评估铂/铱,不锈钢和硅制品在常压和真空下在真空质量比较器和瓦特天平以及X射线晶体所使用的典型压力范围内测得的质量变化而进行的工作密度(XRCD)测量。在这项工作中使用的铂/铱,不锈钢和硅制品的组合具有不同的表面积,并通过测量它们之间的相对质量变化来评估在大气压和不同真空度之间传递它们的效果。在0.1 Pa至100 000 Pa(大气压)的压力范围内发现了伪影之间的质量差可逆。在较低的压力(0.001 Pa至0.1 Pa)下,所有伪像之间的质量差是稳定的,与增加压力相比,当压力下降时,没有发现在此范围内出现滞后的迹象。因此,如果在此压力范围内执行测量,则可以实现功率平衡,XRCD测量和真空质量测量之间的一致结果。

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