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PHASE STABIITY OF ELECTRODEPOSITED ALLOYS OF TIN AND IB METALS

机译:锡和IB金属电沉积合金的相稳定性

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Phase structure and stability of electrochemically deposited (ECD) alloys is a topic of great theoretical interest. The phenomenological factors affecting structure of ECD alloys are well known and they from the basis for well sound qualitative explanations. The structural characteristics are determined by electrokinetic supersaturation effect and the related peculiarities of crystal growth in electrocrystallization: near two-dimensional growth front, ineffective surface diffusion and incorporation of atoms at randomly distributed kink sites at the surface. In this work the phase structure of ECD binary alloys of noble metals with Sn is reported and differences with respect to metallurgical alloys and their equilibrium phase diagrams are discussed. Starting from the observation that formation of ordered phases in ECD alloys appears forbidden, it is shown that ECD phase formation can be related to a thermodynamic phase stability interpretation, even though simplistic, when long-range order structures are not considered. Au-Sn deposits were prepared from solutions of thiourea, CS(NH_2)_2 1M and sulphuric acid, H_2SO_4 1M, and containing [Au~+] 0.01÷0.03M and [Sn~(2+)] up to 0.1M, under both direct current (DC) and pulse current (PC) conditions, with cd in the range 0.5÷6 A/dm~2 and 40 deg C on SiTaAu or SiCrNiAu substrates. Ag-Sn alloys electrodeposition was carried out from the following base solution: CS(NH_2)_2 2M, H_2SO_4 0.75M, [Ag~+] 0.1M and [Sn~(2+)] in the range from 0.02 to 0.05 M. Ag-Sn coatings were obtained at cd in the range 4 to 10 mA/cm~2, from quiescent solutions at room temperature on polished brass sheets, coated with a thin silver displacement film. Cu-Sn alloys were electrodeposited from acid solutions, containing either cupric (sulphate) or cuprous (oxide) compounds, on brass or steel substrates. Cu(II) acid solutions were basically simple sulphuric acid and sulphate solutions, with addition of additives such as reducing agents and/or tin ions ligands. Copper as Cu(I) was stabilized in acidic solution (H_2SO_4 1 M) by thiourea addition in concentration from 0.2 to 1.5 M. The source of stannous ions was, for both solutions, SnSO_4 added to a concentration of about 0.1 M. The structure of ECD alloy deposits was studied by X-ray diffraction. Microhardness measurements were used as additional data source for the assessment of phase stability limits.
机译:电化学沉积(ECD)合金的相结构和稳定性是具有重大理论意义的主题。影响ECD合金结构的现象学因素是众所周知的,它们是从良好的定性解释的基础上得出的。结构特征取决于电动过饱和效应和电结晶中晶体生长的相关特性:在二维生长前沿附近,无效的表面扩散以及在表面随机分布的扭结位点处掺入原子。在这项工作中,报告了贵金属与锡的ECD二元合金的相结构,并讨论了冶金合金及其平衡相图的差异。从观察到禁止在ECD合金中形成有序相的观察开始,表明当不考虑长程有序结构时,即使简单,ECD相的形成也可能与热力学相稳定性的解释有关。在以下条件下,由硫脲CS(NH_2)_2 1M和硫酸H_2SO_4 1M的溶液制备Au-Sn沉积物,并在不超过0.1M的条件下含有[Au〜+] 0.01÷0.03M和[Sn〜(2+)]。在Si Ta Au或Si Cr Ni Au基板上,cd的范围为直流(DC)和脉冲电流(PC),cd的范围为0.5÷6 A / dm〜2且40℃。从以下基础溶液中进行Ag-Sn合金的电沉积:CS(NH_2)_2 2M,H_2SO_4 0.75M,[Ag〜+] 0.1M和[Sn〜(2+)]在0.02至0.05 M的范围内。在室温下,由静态溶液在抛光的黄铜板上从静态溶液中获得4到10 mA / cm〜2的cd值的Ag-Sn涂层,并涂上一层薄银置换膜。 Cu-Sn合金是从含有铜(硫酸盐)或亚铜(氧化物)化合物的酸性溶液中电镀到黄铜或钢基底上的。 Cu(II)酸溶液基本上是简单的硫酸和硫酸盐溶液,并添加了还原剂和/或锡离子配体等添加剂。通过添加浓度为0.2到1.5 M的硫脲,在酸性溶液(H_2SO_4 1 M)中稳定了作为铜(Cu)的铜。两种溶液中的亚锡离子源均为SnSO_4,浓度约为0.1M。 X射线衍射研究了ECD合金的沉积。显微硬度测量用作评估相稳定性极限的附加数据源。

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