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Microstructural and Electrochemical Properties of Ti-doped Al_2O_3 Coated LiCoO_2 Films

机译:掺Ti的Al_2O_3涂层LiCoO_2薄膜的微观结构和电化学性能

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摘要

We studied the microstructural and electrochemical properties of Ti-doped Al_2O_3 (Ti-Al_2O_3) coated LiCoO_2 thin films depending on the Ti composition. The 1.27 at.% Ti-Al_2O_3 coated films had an amorphous structure with better conductivity than that of pure Al_2O_3 films. The Ti-Al_2O_3 coating layer effectively suppressed the dissolution of Co and the formation of lower Li conductivity SL1 films at the interface between the LiCoO_2 film and electrolyte. The Ti-Al_2O_3 coating improved the cycling performance and capacity retention at high voltage (4.5 V) of the LiCoO_2 films. The Ti-Al_2O_3 coated LiCoO_2 films showed better eiectrochemical properties than did the pure Al_2O_3 coated LiCoO_2 films. These results were closely related to the enhanced Li-conductivity and interfacial quality of the Ti-Al_2O_3 film.
机译:我们研究了Ti掺杂的Al_2O_3(Ti-Al_2O_3)涂覆的LiCoO_2薄膜的微观结构和电化学性能,具体取决于Ti的组成。 1.27at。%的Ti-Al_2O_3涂层膜具有比纯Al_2O_3膜更好的导电性的非晶结构。 Ti-Al_2O_3涂层有效地抑制了Co的溶解以及在LiCoO_2膜和电解质之间的界面处形成了较低的Li电导率SL1膜。 Ti-Al_2O_3涂层改善了LiCoO_2薄膜的循环性能和在高电压(4.5 V)下的容量保持能力。 Ti-Al_2O_3包覆的LiCoO_2薄膜比纯Al_2O_3包覆的LiCoO_2薄膜具有更好的电化学性能。这些结果与Ti-Al_2O_3薄膜的增强的锂电导率和界面质量密切相关。

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