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Microstructural and electrochemical properties of Ti-doped Al2O3 coated LiCoO2 films

机译:Ti掺杂Al 2 O 3 包覆的LiCoO 2 薄膜的组织和电化学性能

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摘要

We studied the microstructural and electrochemical properties of Ti-doped Al2O3 (Ti-Al2O3) coated LiCoO2 thin films depending on the Ti composition. The 1.27 at.% Ti-Al2O3 coated films had an amorphous structure with better conductivity than that of pure Al2O3 films. The Ti-Al2O3 coating layer effectively suppressed the dissolution of Co and the formation of lower Li conductivity SEI films at the interface between the LiCoO2 film and electrolyte. The Ti-Al2O3 coating improved the cycling performance and capacity retention at high voltage (4.5 V) of the LiCoO2 films. The Ti-Al2O3 coated LiCoO2 films showed better electrochemical properties than did the pure Al2O3 coated LiCoO2 films. These results were closely related to the enhanced Li-conductivity and interfacial quality of the Ti-Al2O3 film.
机译:我们研究了Ti掺杂的Al 2 O 3 (Ti-Al 2 O 3 )涂覆的LiCoO 2 薄膜,具体取决于Ti的组成。 1.27 at。%Ti-Al 2 O 3 涂层膜具有非晶态结构,其电导率优于纯Al 2 O > 3 电影。 Ti-Al 2 O 3 涂层有效地抑制了Co的溶解以及在LiCoO 2 界面处形成较低电导率的SEI膜。薄膜和电解质。 Ti-Al 2 O 3 涂层改善了LiCoO 2 膜在高电压(4.5 V)下的循环性能和容量保持率。 Ti-Al 2 O 3 包覆的LiCoO 2 膜的电化学性能优于纯Al 2 O 3 涂覆的LiCoO 2 薄膜。这些结果与Ti-Al 2 O 3 膜的增强的锂电导率和界面质量密切相关。

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