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首页> 外文期刊>Materials science in semiconductor processing >Cu_2O/TiO_2 nanoporous thin-film heterojunctions: Fabrication and electrical characterization
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Cu_2O/TiO_2 nanoporous thin-film heterojunctions: Fabrication and electrical characterization

机译:Cu_2O / TiO_2纳米多孔薄膜异质结:制备和电学表征

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摘要

In this paper, cuprous oxide (Cu_2O)/titanium dioxide (TiO_2) diodes have been fabricated by a facile and inexpensive method for possible use in solar cells. TiO_2 nanoporous films were prepared through anodization of Ti foil and Cu_2O films were deposited on it to make the diode through electrodeposition. The structural and morphological characterization was studied by X-ray diffraction (XRD) and scanning electron microscope (SEM). In electrical characterization the current-voltage (I-V) and capacitance-voltage (C-V) characteristics of the diodes were measured at room temperature. The linear behavior of C-V curve indicated that the carrier concentration was homogeneous in the film region adjacent to the equilibrium space-charge region. The thickness of the depletion region ω ? 29 nm, carrier concentration N?8 × 10~(22) m~(-3) and built in potential ? 0.80 V was estimated from C-V graph. The transport mechanism was due to the Poole-Frankel field effect because the experimentally obtained value of β was close to the theoretical value calculated for the Poole-Frenkel in log I against V~(1/2) graph. The values of several electrical parameters such as ideality factor, barrier height, and series resistances were calculated from I-V, Cheung's and Norde's functions.
机译:在本文中,已经通过一种廉价的廉价方法制备了氧化亚铜(Cu_2O)/二氧化钛(TiO_2)二极管,以用于太阳能电池。通过钛箔的阳极氧化制备TiO_2纳米多孔膜,并在其上沉积Cu_2O膜,通过电沉积制备二极管。通过X射线衍射(XRD)和扫描电子显微镜(SEM)研究了结构和形态特征。在电学表征中,在室温下测量了二极管的电流-电压(I-V)和电容-电压(C-V)特性。 C-V曲线的线性行为表明,在邻近平衡空间电荷区域的膜区域中,载流子浓度是均匀的。耗尽区的厚度ω≥ 29 nm,载流子浓度为N?8×10〜(22)m〜(-3),内在电势为?根据C-V曲线估计为0.80V。传输机理归因于Poole-Frankel场效应,因为实验获得的β值接近log I中针对V〜(1/2)图的Poole-Frenkel计算的理论值。根据I-V,Cheung和Norde函数计算了几个电气参数的值,例如理想因子,势垒高度和串联电阻。

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