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Gaussian distribution of inhomogeneous barrier height in Au-Si (111) Schottky barrier diodes at low temperatures

机译:Au / n-Si(111)肖特基势垒二极管在低温下非均匀势垒高度的高斯分布

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摘要

Forward bias current-voltage (I-V) characteristics of Au-Si (111) Schottky barrier diode (SBD) were investigated in the temperature range of 80-290 K. Analysis of temperature dependent I-V data in terms of thermionic emission (TE) theory revealed an abnormal increase in zero-bias barrier height (Φ_(Bo)) and decrease in ideality factor (n) with increasing temperature. Such behavior of Φ_(Bo) and n was attributed to barrier inhomo-geneities by assuming a Gaussian distribution (GD) of barrier height. Therefore, mean barrier height and effective Richardson constant (A~*) values were extracted from the modified Richardson plot, and extracted A~* was found close to the theoretical value for n-type Si. Hence, it has been concluded that temperature dependent I-V characteristics of the SBD can be successfully explained on the basis of TE theory with GD of barrier height. In addition, series resistance and energy profile of density of interface traps in the SBD were also investigated.
机译:在80-290 K的温度范围内研究了Au / n-Si(111)肖特基势垒二极管(SBD)的正向偏置电流-电压(IV)特性。根据热电子发射(TE)分析与温度有关的IV数据理论表明,零偏压势垒高度(Φ_(Bo))异常增加,而理想因子(n)随着温度升高而降低。 Φ_(Bo)和n的这种行为通过假设势垒高度的高斯分布(GD)归因于势垒不均匀性。因此,从修正的Richardson图中提取平均势垒高度和有效Richardson常数(A〜*)值,发现提取的A〜*接近于n型Si的理论值。因此,可以得出结论,基于TE理论和势垒高度GD可以成功地解释SBD随温度变化的I-V特性。此外,还研究了SBD中界面陷阱的串联电阻和能量分布。

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