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首页> 外文期刊>Materials science in semiconductor processing >Optoelectronic properties of CdTe/Si heterojunction prepared by pulsed Nd:YAG-laser deposition technique
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Optoelectronic properties of CdTe/Si heterojunction prepared by pulsed Nd:YAG-laser deposition technique

机译:脉冲Nd:YAG激光沉积技术制备CdTe / Si异质结的光电性能

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摘要

The present study is on the optoelectronic properties of isotype CdTe/c-Si heterojunction photodetector made by deposition of CdTe by pulsed laser deposition (PLD) technique on clean monocrystalline Si. Optical, electrical and structural properties of grown CdTe film were investigated. The optical data show that the optical band gap of CdTe was around 1.45 eV at 300 K. The CdTe/Si junction exhibits fair diode rectification and the soft breakdown occurred at VB>9 V. Dark and illuminated I–V characteristics of the CdTe/Si photodetector are examined at room temperature. The photodetector showed good photosensitivity in the visible and near-infrared regions with a value as high as 0.5A/W at 950 nm.
机译:本研究是通过在干净的单晶硅上通过脉冲激光沉积(PLD)技术沉积CdTe制成的同型CdTe / c-Si异质结光电探测器的光电性能。研究了生长的CdTe薄膜的光学,电学和结构性能。光学数据表明,在300 K时CdTe的光学带隙为1.45 eV左右。CdTe/ Si结表现出良好的二极管整流性能,并且在VB> 9 V时发生了软击穿。 Si光电探测器在室温下检查。光电探测器在可见光和近红外区域显示出良好的光敏性,在950 nm处的灵敏度高达0.5A / W。

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