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The source of negative capacitance and anomalous peak in the forward bias capacitance-voltage in Cr/p-si Schottky barrier diodes (SBDs)

机译:Cr / p-si肖特基势垒二极管(SBD)的正向偏置电容-电压中的负电容和异常峰的来源

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The frequency and voltage dependence of capacitance voltage (C-V) and conductance-voltage (G/w-V) characteristics of the Cr/p-Si metal semiconductor (MS) Schottky barrier diodes (SBDs) were investigated in the frequency and applied bias voltage ranges of 10 kHz to 5 MHz and (-4 V)-(+4 V), respectively, at room temperature. The effects of series resistance (R-S) and density distribution of interface states (N-SS), both on C-V and G/w-V characteristics were examined in detail. It was found that capacitance and conductance, both, are strong functions of frequency and applied bias voltage. In addition, both a strong negative capacitance (NC) and an anomalous peak behavior were observed in the forward bias C-V plots for each frequency. Contrary to the behavior of capacitance, conductance increased with the increasing applied bias voltage and there happened a rapid increase in conductance in the accumulation region for each frequency. The extra-large NC in SBD is a result of the existence of R-S, N-SS and interfacial layer (native or deposited). In addition, to explain the NC behavior in the forward bias region, we drew the C-I and G/w-I plots for various frequencies at the same bias voltage. The values of C decrease with increasing frequency at forward bias voltages and this decrease in the NC corresponds to an increase in conductance. The values of N-SS were obtained using a Hill-Coleman method for each frequency and it exhibited a peak behavior at about 30 kHz. The voltage dependent profile of R-S was also obtained using a Nicollian and Brews methods. (C) 2015 Elsevier Ltd. All rights reserved.
机译:研究了Cr / p-Si金属半导体(MS)肖特基势垒二极管(SBD)的电容电压(CV)的频率和电压依赖性以及电导电压(G / wV)特性。在室温下分别为10 kHz至5 MHz和(-4 V)-(+ 4 V)。详细研究了串联电阻(R-S)和界面态密度分布(N-SS)对C-V和G / w-V特性的影响。发现电容和电导率都是频率和施加的偏置电压的强函数。此外,在每个频率的正向偏置C-V图中都观察到了强的负电容(NC)和异常的峰值行为。与电容的行为相反,电导随施加的偏置电压的增加而增加,并且在每个频率下累积区域的电导都迅速增加。 SBD中超大NC是R-S,N-SS和界面层(本机或沉积)存在的结果。另外,为了解释正向偏置区域中的NC行为,我们绘制了在相同偏置电压下各种频率的C-I和G / w-I图。 C值在正向偏置电压下随频率增加而减小,而NC中的减小对应于电导的增加。使用Hill-Coleman方法获得每个频率的N-SS值,并在约30 kHz处表现出峰值行为。还使用Nicollian和Brews方法获得R-S的电压依赖性曲线。 (C)2015 Elsevier Ltd.保留所有权利。

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