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首页> 外文期刊>Materials Science and Technology: MST: A publication of the Institute of Metals >Effect of heat treatment on microstructure and transparent conducting properties of sol-gel ZnO/Al thin films
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Effect of heat treatment on microstructure and transparent conducting properties of sol-gel ZnO/Al thin films

机译:热处理对溶胶-凝胶ZnO / Al薄膜微观结构和透明导电性能的影响

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摘要

Transparent and conducting Al doped ZnO (AZO) thin films with c axis preferred orientation were prepared on glass substrates via the sol-gel route. The physical and chemical changes of the precursors during thermal treatment were systematically investigated by differential scanning calorimeter and thermogravimetric analysis and the crystallinity of AZO films was characterised by X-ray diffraction. The surface morphology evolution of the films post-heated at 420, 450, 530 and 550 deg C respectively was observed by SEM. Results reveal that the crystallising process of ZnO/Al comprises two stages: the primary nucleation and growth occurs at 318 deg C and the continuous crystallisation at 488 deg C. The optimised preheating and post-heating temperatures are determined at 420 and 530 deg C respectively. The annealing treatment in vacuum can contribute considerably to the electrical conductivity. The film post-heated at 530 deg C shows a homogenous dense microstructure and exhibits the minimum sheet resistance of 140 OMEGA/sq. The visible optical transmittance of all films is more than 90 percent.
机译:通过溶胶-凝胶法在玻璃基板上制备了c轴取向较好的透明导电Al掺杂的ZnO(AZO)薄膜。通过差示扫描量热仪和热重分析系统地研究了热处理过程中前体的物理和化学变化,并通过X射线衍射表征了AZO膜的结晶度。通过SEM观察分别在420、450、530和550℃下后加热的膜的表面形貌演变。结果表明ZnO / Al的结晶过程包括两个阶段:初始成核和生长在318摄氏度发生,连续结晶在488摄氏度。优化的预热和后热温度分别在420和530摄氏度下确定。真空中的退火处理可大大有助于导电性。后加热到530℃的薄膜显示出均匀的致密微观结构,并显示出140 OMEGA / sq的最小薄层电阻。所有薄膜的可见光透射率均超过90%。

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