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首页> 外文期刊>Materials transactions >Infrared Reflection Absorption Study for Carbon Monoxide Adsorption on Chromium Deposited Cu(100) Surfaces
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Infrared Reflection Absorption Study for Carbon Monoxide Adsorption on Chromium Deposited Cu(100) Surfaces

机译:一氧化碳在铬沉积的Cu(100)表面上的红外反射吸收研究

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This study investigates carbon monoxide (CO) adsorption and desorption behaviors on 0.1-0.6-nm-thick Cr-deposited Cu(100) surfaces using infrared reflection absorption (IRRAS) and temperature-programmed desorption (TPD) spectroscopic methods. The low-energy electron diffraction (LEED) pattern for the 0.1-nm-thick Cr-deposited Cu(100) surface indicates that distorted bcc-Cr(HO) grows on fcc-Cu(100). The CO exposure to a clean Cu(100) at 90 K produces a single and sharp IR absorption band at 2090 cm~(-1) that is attributable to adsorbed CO on the on-top site of the Cu atoms' on the surface. Two absorption bands are located at 2085 and 2105 cm~(-1) on the IRRAS spectrum for the CO-saturated 0.1-nm-thick Cr/Cu(110) surface. The former might originate from linearly bonded CO on the uncovered Cu substrate surface. With increasing Cr thickness, the latter high-frequency band becomes prominent. For the 0.3-nm-thick Cr surface, the band at 2117 cm~(-1) dominates all spectra through CO exposure. The TPD spectra of the Cr-deposited Cu surfaces show two remarkable features at 220-250 and 320-390 K, which are ascribable respectively to Cu-CO and Cr-CO bonds. Lower desorption peaks shift to higher temperatures with increasing Cr thickness. Based on TPD and IRRAS results, adsorption-desorption behaviors of CO on the Cr-deposited Cu(100) surfaces are discussed herein.
机译:本研究使用红外反射吸收(IRRAS)和程序升温脱附(TPD)光谱方法研究了0.1-0.6nm厚的Cr沉积Cu(100)表面上的一氧化碳(CO)吸附和脱附行为。厚度为0.1 nm的Cr沉积的Cu(100)表面的低能电子衍射(LEED)模式表明,扭曲的bcc-Cr(HO)在fcc-Cu(100)上生长。 CO在90 K下暴露于干净的Cu(100)会在2090 cm〜(-1)处产生一个单一且清晰的IR吸收带,这归因于表面上Cu原子顶部位置上吸附的CO。对于CO饱和的0.1nm厚的Cr / Cu(110)表面,IRRAS光谱上的两个吸收带位于2085和2105 cm〜(-1)处。前者可能源自未覆盖的Cu基材表面上的线性键合CO。随着Cr厚度的增加,后面的高频频带变得突出。对于厚度为0.3 nm的Cr表面,通过CO暴露,在2117 cm〜(-1)处的谱带主导了所有光谱。 Cr沉积的Cu表面的TPD光谱在220-250和320-390 K处显示两个显着特征,分别归因于Cu-CO和Cr-CO键。随着Cr厚度的增加,较低的解吸峰移至较高的温度。基于TPD和IRRAS结果,本文讨论了CO在Cr沉积的Cu(100)表面上的吸附-解吸行为。

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