A robust method of enhancement of protection ability of electrodeposited silane film over copper surface using H2O2

摘要

The enhancement of protection of copper through pretreatment of metal surface with H2O2 and subsequent addition of H2O2 in the electrodeposition of 3-mercaptopropyltrimethoxysilane (MPTS) has been investigated in the present work. MPTS films over copper surface with and without H2O2 were investigated by FT-IR, XRD, Raman spectroscopy and SEM. The protection of copper surface by MPTS in the presence and absence of H2O2 in 1% NaCl medium was also investigated by electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization studies (PDS). The results of the study indicate that MPTS film electrodeposited on pretreated copper with 1000 ppm of H2O2 increases the inhibition efficiency to almost 100%.