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首页> 外文期刊>Canadian Journal of Physics >Growth of CuInSe ~2 thin films by a single-step electrodeposition technique using acetonitrile as complexing agent
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Growth of CuInSe ~2 thin films by a single-step electrodeposition technique using acetonitrile as complexing agent

机译:使用乙腈作为络合剂的一步电沉积技术生长CuInSe〜2薄膜

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Thin films of CuInSe _2 were grown on SnO _2 coated glass microslides using a single-step electrodeposition technique. The bath was made up of a mixture of aqueous solutions of CuCl _2, InCl _3, and SeO _2 with acetonitrile (CH _3CN) acting as a complexing agent. Voltametric studies suggest that acetonitrile is a suitable complexing agent, which helps in bringing the deposition potentials of Cu, In, and Se close to each other. The films were characterized by EDAX, SIMS, X-ray diffraction, and optical studies, which show that the material is CuInSe _2, with a direct band gap of about 1 eV. The films were annealed in a Se atmosphere to improve their crystalline properties. X-ray diffractograms show that the peaks of CuInSe _2, which are broad and of low intensity for as-grown films, become sharp and intense after annealing in Se atmosphere. SIMS depth profiles show that the films have a fairly uniform composition along the depth of the films.
机译:使用一步电沉积技术,在SnO _2涂层的玻璃微片上生长CuInSe _2薄膜。该浴由CuCl _2,InCl _3和SeO _2的水溶液与乙腈(CH _3CN)作为络合剂的混合物组成。伏安研究表明,乙腈是一种合适的络合剂,有助于使Cu,In和Se的沉积电位彼此接近。通过EDAX,SIMS,X射线衍射和光学研究对薄膜进行了表征,结果表明该材料为CuInSe _2,直接带隙约为1 eV。膜在硒气氛中退火以改善其结晶性能。 X射线衍射图表明,CuInSe _2的峰宽大且强度低,适用于成膜,在Se气氛中退火后变得尖锐而强烈。 SIMS深度剖面表明,膜沿膜的深度具有相当均匀的组成。

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