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Defect states in amorphous Ge_2Sb_2Te_5 phase change material

机译:非晶态Ge_2Sb_2Te_5相变材料中的缺陷态。

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Steady-state photoconductivity measurements in the temperature range 100-300 K on amorphous Ge_2Sb_2Te_5 thin film prepared by dc sputtering are analyzed. The dark conductivity is thermally activated with a single activation energy that allocates the position of the Fermi level approximately in the middle of the energy gap relative to the valance band edge. The temperature dependence of the photoconductivity ensures the presence of a maximum normally observed in chalcogenides with low- and high-temperature slopes, which predict the location of discrete sets of localized states (recombination levels) in the gap. The presence of these defect states close to the valence and conduction band edges leaves the quasi Fermi level shifts in a continuous distribution of gap states at high temperatures, as evidenced from the γ values of the lux-ampere characteristics.
机译:分析了通过直流溅射制备的非晶Ge_2Sb_2Te_5薄膜在100-300 K温度范围内的稳态光电导率测量结果。暗导电性通过单个激活能量进行热激活,该激活能量将费米能级的位置大约分配在相对于价带边缘的能隙中间。光电导的温度依赖性确保了在通常具有低温和高温斜率的硫属化物中观察到的最大值,该最大值预测了间隙中离散状态的局部集(复合水平)的位置。这些缺陷状态的存在接近价态和导带边缘,从而在高温下以连续的间隙状态分布使准费米能级位移,这从勒克斯-安培特性的γ值可以看出。

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