首页> 外国专利> PHASE-CHANGE MEMORY DEVICE AND A METHOD OF FORMING THE SAME, CAPABLE OF FORMING AN AMORPHOUS PHASE CHANGE MATERIAL LAYER

PHASE-CHANGE MEMORY DEVICE AND A METHOD OF FORMING THE SAME, CAPABLE OF FORMING AN AMORPHOUS PHASE CHANGE MATERIAL LAYER

机译:相变存储器件及其形成方法,能够形成非晶相变材料层

摘要

PURPOSE: A phase-change memory device and a method of forming the same are provided to improve the reliability of a phase change memory device by forming a phase change material pattern without a void uniformly.;CONSTITUTION: In a phase-change memory device and a method of forming the same, a bottom electrode(45) is formed on a substrate(10). A phase change material pattern(55) is formed on the bottom electrode, and an upper electrode(65) is included in the phase change material pattern. The phase change material pattern contains Sb, and the content of Sb is over 50% in it. The phase change material pattern is amorphous. An insulating layer(20) includes a contact hole, exposing the bottom electrode, on the top of the substrate.;COPYRIGHT KIPO 2010
机译:目的:提供一种相变存储器件及其形成方法,以通过均匀地形成没有空隙的相变材料图案来提高相变存储器件的可靠性。在其形成方法中,在基板(10)上形成底部电极(45)。相变材料图案(55)形成在底部电极上,并且上电极(65)包括在相变材料图案中。相变材料图案包含Sb,并且其中Sb的含量超过50%。相变材料图案是非晶的。绝缘层(20)在基板的顶部包括一个露出底部电极的接触孔。; COPYRIGHT KIPO 2010

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号