WET CHEMICAL ETCHING OF LEAD ZIRCONATE TITANATE THIN FILM FOR MICROELECTROMECHANICAL SYSTEMS APPLICATIONS

摘要

PbZr_0.52Ti_0.48O_3 thin film prepared by metal-organic decomposition method was chemically etched by utilizing HF/HNO_3 solution. Typical semiconductor processes were used to pattern the film. The dependence of the conformity of pattern transfer on the microstructure of the film was studied. The results showed that the etching rates were different between the islands of the grains and the surrounding areas within the film. The film with small grains is favored for pattern transfer of fidelity. The dimension of the islands of grains contributes greatly to the tolerance of patterned features. Tolerance of 2 mum has been achieved to fulfill the need of usage in microelectromechanical systems.