首页> 外文期刊>Ferroelectrics: Letters Section >FERROELECTRIC PROPERTIES OF La_(0.75)Bi_(3.25)Ti_3O_(12) CERAMIC AND THIN FILMS PREPARED BY PULSED LASER DEPOSITION
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FERROELECTRIC PROPERTIES OF La_(0.75)Bi_(3.25)Ti_3O_(12) CERAMIC AND THIN FILMS PREPARED BY PULSED LASER DEPOSITION

机译:脉冲激光沉积制备La_(0.75)Bi_(3.25)Ti_3O_(12)的陶瓷和薄膜的铁电性能

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摘要

Bi_(4-x)La_xTi_3O_(12) ceramics with various La contents (x=0, 0.25, 0.50, 0.75, 1.00) are fabricated using ordinary firing (OF) and hot forging (HF) method. The hysteresis loop of BLT films deposited with HF(//) ceramic target displays low remnant polarization compared with that of OF ceramic target. The grain orientation of the ceramic target has a remarkable influence on the hysteresis loop of the film grown using PLD method. So, it is necessary to use the HF(perpendicular) ceramic target in the PLD process in order to obtain good ferroelectric properties for the film.
机译:使用普通烧结(OF)和热锻(HF)方法制造具有各种La含量(x = 0、0.25、0.50、0.75、1.00)的Bi_(4-x)La_xTi_3O_(12)陶瓷。与OF陶瓷靶相比,沉积有HF(//)陶瓷靶的BLT膜的磁滞回线显示出较低的残余极化。陶瓷靶的晶粒取向对使用PLD方法生长的薄膜的磁滞回线有显着影响。因此,有必要在PLD工艺中使用HF(垂直)陶瓷靶,以获得良好的铁电性能。

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