机译:通过脉冲激光沉积获得的导电Sr_4Ru_2O_9电极上的铁电Bi_(3.25)La_(0.75)Ti_3O_(12)薄膜
Laboratoire de et Materiaux et Microelectronique de Provence, CNRS-UMR 6137, Universite du Sud Toulon-Var, BP20132, 83957 La Garde Cedex, France;
pulsed laser deposition; FeRAM; ferroelectric thin films; Bi_(3.25)La_(0.75)Ti_3O_(12); Sr_4Ru_2O_9; electron microscopy;
机译:脉冲激光沉积制备La_(0.75)Bi_(3.25)Ti_3O_(12)的陶瓷和薄膜的铁电性能
机译:La_(0.7)Sr_(0.3)MnO_3电极缓冲的Bi_(3.25)Nd_(0.75)Ti_3O_(12)薄膜的脉冲激光沉积和表征
机译:YSZ(100)上多对SrRuO_3 / Pt(111)电极上的(104)取向Bi_(3.25)La_(0.75)Ti_3O_(12)和Bi_(3.54)Nd_(0.46)Ti_3O_(12)铁电薄膜的微观结构缓冲硅(100)
机译:MOD法制备Bi_(3.25)La_(0.75)Ti_3O_(12)和Bi_(3.25)Nd_(0.75)Ti_3O_(12)薄膜的结构和铁电性能
机译:脉冲激光沉积制备的铁电锶(0.16)钡(0.39)铌酸盐薄膜的微波特性。
机译:衬底温度和氧分压对脉冲激光沉积生长纳米晶铜氧化物薄膜性能的影响
机译:通过脉冲激光沉积获得的导电Sr4Ru2O9电极上的铁电Bi3.25La0.75Ti3O12薄膜