首页> 外文期刊>Ferroelectrics: Letters Section >Effect of Orientation on the Dielectric Properties of Pb_(0.97)La_(0.02)Zr_(0.95)Ti_(0.05)O_3 (PLZT) Antiferroelectric Thin Films
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Effect of Orientation on the Dielectric Properties of Pb_(0.97)La_(0.02)Zr_(0.95)Ti_(0.05)O_3 (PLZT) Antiferroelectric Thin Films

机译:取向对Pb_(0.97)La_(0.02)Zr_(0.95)Ti_(0.05)O_3(PLZT)反铁电薄膜介电性能的影响

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摘要

Through sol-gel technique, Pb_(0.97)La_(0.02)Zr_(0.95)Ti_(0.05)O_3 (PLZT) antiferroelectric thin films were deposited on Pt(111)/Ti/SiO_2/Si(100) and Pt(200)/Ti/SiO_2/Si(100) substrates, respectively. X-ray diffraction (XRD) analysis indicated that films derived on the Pt(111)/Ti/SiO_2/Si(100) substrates showed a strong (111) preferred orientation. The dependence of electrical properties derived on the two different substrates had been studied by P-E and C-V measurements. The temperature dependence of the dielectric constant denoted that the Curie temperature (T_c) of the PLZT antiferroelectric thin films deposited on Pt(111)/Ti/SiO_2/Si(100) and Pt(200)/Ti/SiO_2/Si(100) substrates were 193 deg C and 203deg C, respectively.
机译:通过溶胶-凝胶技术,在Pt(111)/ Ti / SiO_2 / Si(100)和Pt(200)上沉积Pb_(0.97)La_(0.02)Zr_(0.95)Ti_(0.05)O_3(PLZT)反铁电薄膜/ Ti / SiO_2 / Si(100)衬底。 X射线衍射(XRD)分析表明,在Pt(111)/ Ti / SiO_2 / Si(100)基底上衍生的薄膜表现出很强的(111)优选取向。通过P-E和C-V测量研究了衍生于两种不同基材的电性能的依赖性。介电常数的温度依赖性表示沉积在Pt(111)/ Ti / SiO_2 / Si(100)和Pt(200)/ Ti / SiO_2 / Si(100)上的PLZT反铁电薄膜的居里温度(T_c)基板分别为193摄氏度和203摄氏度。

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