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首页> 外文期刊>Ferroelectrics: Letters Section >Growth and Micro-Raman Study of RF Magnetron Sputter Deposited PbTiO3 Thin Films
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Growth and Micro-Raman Study of RF Magnetron Sputter Deposited PbTiO3 Thin Films

机译:射频磁控溅射沉积PbTiO3薄膜的生长和显微拉曼研究

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摘要

PbTiO_3 thin films have been prepared on Si <100> and MgO <100> substrates using sequential RF magnetron sputtering of Pb and Ti targets. As deposited films were post annealed in the presence of oxygen to get PbTiO_3 phase. Films were characterized using Xrd, SEM, XPS and temperature dependent Micro-Raman studies. Micro-Raman spectra were obtained from 75K to 550K. We have investigated the low temperature phase transitions and noticed that there is a possible evidence for the structural phase transitions in our low temperature Raman data of the polycrystalline PT films.
机译:使用Pb和Ti靶材的连续RF磁控溅射在Si <100>和MgO <100>衬底上制备了PbTiO_3薄膜。将沉积的薄膜在氧气存在下进行后退火,得到PbTiO_3相。使用Xrd,SEM,XPS和依赖温度的Micro-Raman研究对薄膜进行表征。显微拉曼光谱从75K到550K获得。我们已经研究了低温相变,并注意到在我们的多晶PT薄膜的低温拉曼数据中有可能证明结构相变。

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