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首页> 外文期刊>Ferroelectrics: Letters Section >THE EFFECT OF THERMAL ANNEALINGS OF PZT THIN FILMS PREPARED BY SOL-GEL
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THE EFFECT OF THERMAL ANNEALINGS OF PZT THIN FILMS PREPARED BY SOL-GEL

机译:溶胶凝胶法制备PZT薄膜的热退火效应

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摘要

Properties of Pb(Zr_(0.52)Ti_(0.48))O_3 ferroelectric thin films prepared by rapid thermal annealing(RTA)/direct insertion thermal annealing(DITA) were investigated. The morphologies and ferroelectric properties are affected strongly by thermal treatment. The remnant polarization(Pr), and coercive force(Ec) of typical sample are about 13.7 mu C/cm~2 and 55.6 kV/cm, respectively. The dielectric constant and loss tangent are 786 and 2.4 percent at 100 Hz respectively. The PZT film prepared by RTA and dried at 350 deg C possesses desirable ferroelectric and insulation properties, which is applicable to FRAM or piezoelectric MEMS.
机译:研究了通过快速热退火(RTA)/直接插入热退火(DITA)制备的Pb(Zr_(0.52)Ti_(0.48))O_3铁电薄膜的性能。热处理会严重影响形貌和铁电性能。典型样品的剩余极化强度(Pr)和矫顽力(Ec)分别约为13.7μC / cm〜2和55.6 kV / cm。 100 Hz时的介电常数和损耗角正切分别为786%和2.4%。通过RTA制备并在350℃下干燥的PZT膜具有理想的铁电和绝缘性能,适用于FRAM或压电MEMS。

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