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首页> 外文期刊>Ferroelectrics >Structures and Dielectric Properties of SrNb_xTi_(1-x)O_3 Thin Films Prepared by Pulsed Laser Deposition
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Structures and Dielectric Properties of SrNb_xTi_(1-x)O_3 Thin Films Prepared by Pulsed Laser Deposition

机译:脉冲激光沉积制备SrNb_xTi_(1-x)O_3薄膜的结构和介电性能

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SrNb_xTi_(1-x)O_3 (0.001 ≤ x ≤ 0.01) thin films have been prepared on Pt/TiO_2/SiO_2/Si (100) substrates by pulsed laser deposition. X-ray diffracttion and scanning electron microscope studies indicate that all the films were well crystallized and homogeneous with a cubic perovskite structure. Dielectric constant increases from 246 at x equals 0.001 to 342 at x equals 0.01, meanwhile, the dielectric tunability also increases. J-E characteristics of the films suggest that ohmic behavior is predominant at low electric field for all the films, but different conduction mechanisms are predominant at high electric field for the films with different x value.
机译:通过脉冲激光沉积在Pt / TiO_2 / SiO_2 / Si(100)衬底上制备了SrNb_xTi_(1-x)O_3(0.001≤x≤0.01)薄膜。 X射线衍射和扫描电子显微镜研究表明,所有薄膜均具有良好的结晶性和均匀性,具有立方钙钛矿结构。介电常数从x等于0.001的246增加到x等于0.01的342,同时,介电可调性也增加。薄膜的J-E特性表明,所有薄膜在低电场下均表现出欧姆特性,而对于x值不同的薄膜,在高电场下则表现出不同的导电机理。

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