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Epitaxial Growth and Ferroelectricity of BaTiO_3 on SrRuO_3/TiO_2 Buffered GaN

机译:SrRuO_3 / TiO_2缓冲GaN上BaTiO_3的外延生长和铁电性。

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摘要

Epitaxial growth of (111)-oriented BaTiO_3 thin films on GaN/Al_2O_3 (0001) substrates has been realized by intervening epitaxial (111) SrRuO_3/(100)TiO_2 buffer layers. Rutile TiO_2 was deposited by Laser molecular beam epitaxial firstly and the deposition process of TiO_2 layer was in-situ monitored by reflective high energy electron diffractions. After that SrRuO_3 conductive films and BaTiO_3ferroelectric films were fabricated via pulsed laser deposition. The perovskite BaTiO_3 films were epitaxially grown on wurtzite GaN as revealed by X-ray diffraction. Electrical measurements demonstrate that the BaTiO_3 films possess a saturation ferroelectric hysteresis loop, butterfly-shape C-V curve and low leakage current density. These results show that BaTiO_3 films with favorable electrical performance could be epitaxially grown on GaN using SrRuO_3/TiO_2 bufferlayer.
机译:通过插入外延(111)SrRuO_3 /(100)TiO_2缓冲层,已经实现了在GaN / Al_2O_3(0001)衬底上的(111)取向BaTiO_3薄膜的外延生长。首先通过激光分子束外延沉积金红石型TiO_2,并通过反射高能电子衍射原位监测TiO_2层的沉积过程。之后,通过脉冲激光沉积制备了SrRuO_3导电膜和BaTiO_3铁电膜。 X射线衍射显示钙钛矿型BaTiO_3薄膜在纤锌矿GaN上外延生长。电学测量表明,BaTiO_3薄膜具有饱和铁电磁滞回线,蝶形C-V曲线和低漏电流密度。这些结果表明,使用SrRuO_3 / TiO_2缓冲层可以在GaN上外延生长具有良好电性能的BaTiO_3薄膜。

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