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首页> 外文期刊>Bulletin of the Korean Chemical Society >Interaction of SO_2 with Oxygen on Ni(100) Studied by XPS and NEXAFS
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Interaction of SO_2 with Oxygen on Ni(100) Studied by XPS and NEXAFS

机译:XPS和NEXAFS研究SO_2与氧在Ni(100)上的相互作用

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摘要

The adsorption and surface reactions of SO_2 on Ni(100),c(2x2)_O/Ni (100) and NiO(111)/Ni(100) surfaces have been investigated using X-ray photoelectron spectroscopy (XPS) and near-edge X-ray absorption fine structure (NEXAFS) technique.On Ni(100),chemisorbed SO_2 is formed at 160 K.When SO_2 is adsorbed on c(2x2)_O/Ni(100) at 160 K,SO_2 reacts with oxygen to form SO_3 and trace amount of SO_4 species.SO_3 is adsorbed on this surface with its C_3 axis perpendicular to the surface.On a NiO(111)/Ni(100) surface,both SO_3 and SO_4 species are formed at 160 K from adsorbed SO_2.
机译:使用X射线光电子能谱(XPS)和近边缘研究了SO_2在Ni(100),c(2x2)_O / Ni(100)和NiO(111)/ Ni(100)表面上的吸附和表面反应X射线吸收精细结构(NEXAFS)技术。在Ni(100)上,在160 K下形成化学吸附的SO_2。当SO_2在160 K下吸附在c(2x2)_O / Ni(100)上时,SO_2与氧反应形成SO_3和痕量的SO_4物种。SO_3以其C_3轴垂直于该表面的方式吸附在该表面上。在NiO(111)/ Ni(100)表面上,SO_3和SO_4物种在160 K时均由吸附的SO_2形成。

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