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首页> 外文期刊>Bulletin of the Korean Chemical Society >Size and Density of Graphene Domains Grown with Different Annealing Times
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Size and Density of Graphene Domains Grown with Different Annealing Times

机译:不同退火时间生长的石墨烯结构域的尺寸和密度

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Single crystals of hexagonal graphenes were successfully grown on Cu foils using the atmospheric pressure chemical vapor deposition (CVD) method. We investigated the effects of reaction parameters, such as the growth temperature and annealing time, on the size, coverage, and density of graphene domains grown over Cu foil. The mean size of the graphene domains increased significantly with increases in both the growth temperature and annealing time, and similar phenomena were observed in graphene domains grown by low pressure CVD over Cu foil. From the comparison of micro Raman spectroscopy in the graphene films grown with different annealing times, we found that the nucleation and growth of the domains were strongly dependent on the annealing time and growth temperature. Therefore, we confirmed that when reaction time was same, the number of layers and the degree of defects in the synthesized graphene films both decreased as the annealing time increased.
机译:使用大气压化学气相沉积(CVD)方法成功地在铜箔上生长了六边形石墨烯的单晶。我们研究了反应参数(如生长温度和退火时间)对在铜箔上生长的石墨烯畴的尺寸,覆盖率和密度的影响。石墨烯畴的平均尺寸随着生长温度和退火时间的增加而显着增加,并且在通过低压CVD在Cu箔上生长的石墨烯畴中观察到类似现象。通过在不同退火时间下生长的石墨烯薄膜中的显微拉曼光谱比较,我们发现,畴的成核和生长强烈依赖于退火时间和生长温度。因此,我们确认,当反应时间相同时,随着退火时间的增加,合成石墨烯薄膜的层数和缺陷度均降低。

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