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首页> 外文期刊>Bulletin of the Lebedev Physics Institute >Study of the Transverse Conductivity of Polycrystalline Silicon FilmsFabricated by Magnetron Sputtering
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Study of the Transverse Conductivity of Polycrystalline Silicon FilmsFabricated by Magnetron Sputtering

机译:磁控溅射制备多晶硅薄膜的横向电导率研究

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摘要

The transverse conductivity of undoped polycrystalline silicon ( PCS) films 0.2-0.6 μm thick, deposited by magnetron sputtering on heavily doped single-crystal substrates is studied. Molybdenum films 0.4 μm thick were used as top electrodes. The dependences of the film resis-tivity on the electric field strength are obtained, which are described by the space-charge limited conduction model for the quasi-uniform distribution of traps in the PCS band gap.
机译:研究了磁控溅射在重掺杂单晶衬底上沉积的厚度为0.2-0.6μm的未掺杂多晶硅(PCS)薄膜的横向电导率。将0.4μm厚的钼膜用作顶部电极。获得了薄膜电阻率与电场强度的相关性,这由PCS带隙中陷阱的准均匀分布的空间电荷受限传导模型来描述。

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