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Effect of electrodeposition potential on composition and morphology of CIGS absorber thin film

机译:电沉积电势对CIGS吸收剂薄膜组成和形貌的影响

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摘要

CuInGaSe (CIGS) thin films were deposited on Mo/soda-lime glass substrates by electrodeposition at different potentials ranging from -0.3 to -1.1 V vs Ag/AgCl. Cyclic voltammetry (CV) studies of unitary Cu, Ga, In and Se systems, binary Cu-Se, Ga-Se and In-Se systems and quaternary Cu-In-Ga-Se were carried out to understand the mechanism of deposition of each constituent. Concentration of the films was determined by energy dispersive spectroscopy. Structure and morphology of the films were characterized by X-ray diffraction and scanning electron microscope. The underpotential deposition mechanism of Cu-Se and In-Se phases was observed in voltammograms of binary and quaternary systems. Variation in composition with applied potentials was explained by cyclic voltammetry (CV) data. A suitable potential range from -0.8 to -1.0 V was found for obtaining films with desired and stable stoichiometry. In the post-annealing films, chalcopyrite structure starts forming in the samples deposited at -0.5 V and grows on varying the applied potential towards negative direction. By adjusting the composition of electrolyte, we obtained the desired stoichiometry of Cu(In_(0.7)Ga_(0.3))Se_2.
机译:通过在相对于Ag / AgCl的-0.3至-1.1 V范围内的不同电势下进行电沉积,将CuInGaSe(CIGS)薄膜沉积在Mo /钠钙玻璃衬底上。进行了单价Cu,Ga,In和Se系统,二元Cu-Se,Ga-Se和In-Se系统以及四元Cu-In-Ga-Se的循环伏安(CV)研究,以了解每种沉积机理。组分。膜的浓度通过能量色散光谱法确定。通过X射线衍射和扫描电子显微镜表征了膜的结构和形态。在二元和四元体系的伏安图中观察到了Cu-Se和In-Se相的欠电位沉积机理。循环伏安(CV)数据解释了施加电势下成分的变化。发现合适的电位范围为-0.8至-1.0V,以获得具有所需和稳定的化学计量的膜。在后退火膜中,黄铜矿结构开始在以-0.5 V沉积的样品中形成,并在朝负方向改变施加电势时生长。通过调节电解质的组成,我们获得了所需的Cu(In_(0.7)Ga_(0.3))Se_2的化学计量。

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