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Effects of Bi doping on dielectric and ferroelectric properties of PLBZT ferroelectric thin films synthesized by sol-gel processing

机译:Bi掺杂对溶胶-凝胶法合成PLBZT铁电薄膜介电和铁电性能的影响

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摘要

[Pb_(0.95)(La_(1-y)Bi_y)_(0.05)][Zr_(0.53)Ti_(0.47)]O_3 (PLBZT) ferroelectric thin films have been synthesized on indium tin oxide (ITO)-coated glass by sol-gel processing. PLBZT thin films were annealed at a relatively low temperature of 550 °C in oxygen ambient. Effects of Bi doping on structure, dielectric and ferroelectric properties of PLBZT were investigated. Bi doping is useful in crystallization of PLBZT films and promoting grain growth. When the Bi-doping content y is not more than 0.4, an obvious improvement in dielectric properties and leakage current of PLBZT was confirmed. However, when the Bi-doping content is more than 0.6, the pyrochlore phase appears and the remnant polarization P_r of PLBZT thin films is smaller than that of (Pb_(1-x)La_x)(Zr_(1-y)Ti_y) O_3 (PLZT) thin films without Bi doping. PLBZT thin films with excessive Bi-doping content are easier to fatigue than PLZT thin films.
机译:[Pb_(0.95)(La_(1-y)Bi_y)_(0.05)] [Zr_(0.53)Ti_(0.47)] O_3(PLBZT)铁电薄膜已通过氧化铟锡(ITO)涂层玻璃合成溶胶-凝胶加工。 PLBZT薄膜在氧气环境中在550°C的较低温度下退火。研究了Bi掺杂对PLBZT结构,介电和铁电性能的影响。 Bi掺杂可用于PLBZT薄膜的结晶和促进晶粒生长。当Bi掺杂含量y不大于0.4时,证实了PLBZT的介电性能和漏电流的明显改善。但是,当Bi掺杂量大于0.6时,会出现烧绿石相,且PLBZT薄膜的剩余极化强度P_r小于(Pb_(1-x)La_x)(Zr_(1-y)Ti_y)O_3 (PLZT)没有Bi掺杂的薄膜。 Bi掺杂含量过多的PLBZT薄膜比PLZT薄膜更容易疲劳。

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