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AFM observation of force on a dielectric sphere in the evanescent field of totally reflected light

机译:AFM观察全反射光light逝场中电介质球上的力

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We present the first direct measurement of the radiation pressure force acting on a sphere in the evanescent field of a totally reflected light beam using the atomic force microscope (AFM). A dielectric sphere was attached to the AFM cantilever and placed into the evanescent light field of the Ar-laser beam illuminating a sapphire prism surface at an angle larger than the critical. A repulsive force due to the evanescent field was observed. The force decreases exponentially with the characteristic length of (45 +/- 20) nm as the distance between the sphere and the total reflection surface increases. The measured magnitude of the force close to the surface is (3 +/- 1.5) 10(-10) N. Both the magnitude and the decay length are in good agreement with the calculated values. [References: 13]
机译:我们介绍了使用原子力显微镜(AFM)对直接作用在全反射光束的渐逝场上的球体上的辐射压力进行的首次直接测量。将介电球连接到AFM悬臂,并以大于临界角的角度将其放置在照亮蓝宝石棱镜表面的Ar激光束的e逝光场中。观察到由于the逝场而产生的排斥力。随着球体与全反射表面之间距离的增加,力随着特征长度(45 +/- 20)nm呈指数减小。测得的靠近表面的力的大小为(3 +/- 1.5)10(-10)N。大小和衰减长度与计算值非常吻合。 [参考:13]

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