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首页> 外文期刊>Electrochimica Acta >Defect equilibria and chemical expansion in non-stoichiometric undoped and gadolinium-doped cerium oxide
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Defect equilibria and chemical expansion in non-stoichiometric undoped and gadolinium-doped cerium oxide

机译:非化学计量未掺杂和and掺杂的氧化铈中的缺陷平衡和化学膨胀

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摘要

Chemical expansion and oxygen non-stoichiometry of undoped and Gd-doped cerium oxide exposed to different partial pressures of oxygen was studied at 800℃ by dilatometry and thermo-gravimetry, respectively. The results were modeled in terms of isolated defects and defect complexes to successfully predict non-stoichiometry and chemical expansion behavior. A chemical expansion coefficient for isolated defects was determined using the model. A separate chemical expansion coefficient for defect complexes was found to match an empirically predicted value for lattice parameter versus dopant concentration from the literature showing that at room temperature, a considerable fraction of defects are in complexes. The chemical expansion coefficients used were the same for both the undoped and Gd-doped cerium oxide displaying consistency in the model. The results of the model are not only useful in interpreting strain behavior upon reduction in ceria based oxides, but are also useful in explaining conductivity behavior.
机译:分别通过膨胀法和热重法研究了800℃下未掺杂和掺Gd的氧化铈的化学膨胀和非化学计量。根据孤立的缺陷和缺陷复合物对结果进行建模,以成功预测非化学计量和化学膨胀行为。使用该模型确定了隔离缺陷的化学膨胀系数。从文献显示,在室温下,相当大比例的缺陷存在于复合物中,发现缺陷复合物的单独化学膨胀系数与晶格参数与掺杂剂浓度的经验预测值相匹配。在模型中,未掺杂和掺Gd的氧化铈使用的化学膨胀系数相同。该模型的结果不仅可用于解释基于二氧化铈的氧化物还原时的应变行为,而且还可用于解释电导率行为。

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