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Fabrication of integrated arrays of ultrahigh density magnetic nanowires on glass by anodization and electrodeposition

机译:通过阳极氧化和电沉积在玻璃上制备超高密度磁性纳米线的集成阵列

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摘要

Integrated nanowire arrays of Fe-Pt, Co-Pt, and Ni-Pt alloys were successfully fabricated on glass substrates by successive anodization and electrodeposition. Porous alumina films, which were formed from an aluminum layers sputter-deposited on glass substrates covered with transparent oxide conductive films, were used as template-electrodes to deposit various magnetic alloys (Fe-Pt, Co-Pt, and Ni-Pt) in the nanopores by a cathodic electrodeposition, thus leading to integrated nanowire arrays with ultrahigh densities of (0.6-2.1) × 10{sup}15 wirem{sup}(-2). The as-deposited nanowires of Fe-Pt, Co-Pt, and Ni-Pt alloys are poly crystalline and composed of fine crystals (4-7 nm across) of chemically ordered tetragonal FePt, CoPt, or NiPt phase. The integrated nanowire arrays may be the promising candidate materials for ultrahigh density perpendicular magnetic recording media in terabits per square inch regime, due to the predictable enhanced perpendicular magnetic performance after appropriate annealing.
机译:Fe-Pt,Co-Pt和Ni-Pt合金的集成纳米线阵列通过连续阳极氧化和电沉积成功地制造在玻璃基板上。多孔氧化铝膜由模板层电极上形成,该多孔氧化铝膜由溅射沉积在覆盖有透明氧化物导电膜的玻璃基板上的铝层形成,用于沉积各种磁性合金(Fe-Pt,Co-Pt和Ni-Pt)。通过阴极电沉积形成纳米孔,从而导致集成纳米线阵列具有(0.6-2.1)×10 {sup} 15wirem {sup}(-2)的超高密度。 Fe-Pt,Co-Pt和Ni-Pt合金的沉积态纳米线是多晶的,由化学有序的四方FePt,CoPt或NiPt相的微晶(跨度为4-7 nm)组成。由于在适当的退火之后可预测的增强的垂直磁性能,集成的纳米线阵列可能是兆兆伏特/平方英寸的超高密度垂直磁记录介质的有希望的候选材料。

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