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Evidence of Mn Occupation of Ga Site in Ferromagnetic (Ga, Mn)N Semiconductor Observed by EXAFS

机译:EXAFS观测铁磁(Ga,Mn)N半导体中Mn占据Ga位置的证据

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摘要

The local structure of Mn impurities in a ferromagnetic (Ga, Mn)N semiconductor was investigated using extended X-ray absorption fine structure (EXAFS). The ferromagnetic signal increased and maintained up to room temperature as N ions were implanted into Mn-implanted GaN. The X-ray results showed that Mn ions occupied Ga sites to form (Ga, Mn)N semiconductor. The Mn concentration occupying Ga sites increased from 2.5 to 3.8 percent and the formation of Mn-N compounds such as Mn_6N_(2.58) and Mn_3N_2 was prohibited by implanting N atoms. As a result, the N-vacancies reduced and net hole concentration increased, resulting in the enhancement of ferromagnetic property.
机译:使用扩展的X射线吸收精细结构(EXAFS)研究了铁磁(Ga,Mn)N半导体中Mn杂质的局部结构。当N离子注入到Mn注入的GaN中时,铁磁信号增加并保持到室温。 X射线结果表明,Mn离子占据了Ga的位置,形成了(Ga,Mn)N半导体。占据Ga位点的Mn浓度从2.5%增加到3.8%,并且通过注入N原子来禁止形成Mn_N化合物,例如Mn_6N_(2.58)和Mn_3N_2。结果,N空位减少并且净空穴浓度增加,导致铁磁性能增强。

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