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首页> 外文期刊>Physical review >Detection of stacking faults breaking the [110]/[110] symmetry in ferromagnetic semiconductors (Ga,Mn)As and (Ga,Mn)(As,P)
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Detection of stacking faults breaking the [110]/[110] symmetry in ferromagnetic semiconductors (Ga,Mn)As and (Ga,Mn)(As,P)

机译:在铁磁半导体(Ga,Mn)As和(Ga,Mn)(As,P)中检测破坏[110] / [110]对称性的堆垛层错

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摘要

We report on high-resolution x-ray diffraction measurements of (Ga,Mn)As and (Ga,Mn)(As,P) epilayers. We observe a structural anisotropy in the form of stacking faults that are present in the (111) and (111) planes and absent in the (111) and (1ll) planes. They occupy 10~(-2%)-10~'% of the ferromagnetic epilayer volume while no stacking faults are detected in the controlled, undoped GaAs epilayer. Full-potential density functional calculations provide additional evidence that the formation of the stacking faults is promoted by Mn attracted to these structural defects. The enhanced Mn density along the common [ 110] direction of the stacking fault planes produces a symmetry-breaking mechanism of a strength and sense that can account for the uniaxial [ 110]/[ 1 TO] magnetocrystalline anisotropy of these ferromagnetic semiconductors.
机译:我们报告(Ga,Mn)As和(Ga,Mn)(As,P)外延层的高分辨率x射线衍射测量。我们观察到在(111)和(111)平面中存在且在(111)和(1ll)平面中不存在的堆叠断层形式的结构各向异性。它们占据了铁磁外延层体积的10%(-2%)-10%,而在受控的未掺杂GaAs外延层中未检测到堆垛层错。全电位密度泛函计算提供了额外的证据,表明Mn吸引了这些结构缺陷,从而促进了堆垛层错的形成。沿着堆叠断层平面的公共[110]方向增强的Mn密度产生了一种强度和方向对称的断裂机制,可以解释这些铁磁半导体的单轴[110] / [1 TO]磁晶各向异性。

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  • 来源
    《Physical review》 |2011年第23期|p.235324.1-235324.7|共7页
  • 作者单位

    Institute of Physics ASCR, v.v.I., Na Slovance 2, 182 21 Praha 8, Czech Republic;

    Institute of Physics ASCR, v.v.I., Na Slovance 2, 182 21 Praha 8, Czech Republic;

    Institute of Physics ASCR, v.v.I., Na Slovance 2, 182 21 Praha 8, Czech Republic;

    Institute of Physics ASCR, v.v.I., Na Slovance 2, 182 21 Praha 8, Czech Republic;

    Institute of Physics ASCR, v.v.I., Na Slovance 2, 182 21 Praha 8, Czech Republic;

    School of Physics and Astronomy, University of Nottingham, Nottingham NG7 2RD, United Kingdom;

    School of Physics and Astronomy, University of Nottingham, Nottingham NG7 2RD, United Kingdom;

    School of Physics and Astronomy, University of Nottingham, Nottingham NG7 2RD, United Kingdom;

    Institute of Physics ASCR, v.v.I., Cukrovarnickd 10, 162 53 Praha 6, Czech Republic;

    Institute of Physics ASCR, v.v.I., Cukrovarnickd 10, 162 53 Praha 6, Czech Republic School of Physics and Astronomy, University of Nottingham, Nottingham NG7 2RD, United Kingdom;

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  • 正文语种 eng
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  • 关键词

    magnetic semiconductors; experimental determination of defects by diffraction and scattering; Ⅲ-Ⅴ semiconductors;

    机译:磁性半导体通过衍射和散射实验确定缺陷;Ⅲ-Ⅴ族半导体;

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