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Improvement of ATO Electrode Stability by Doping with a Trace Amount of Ir

机译:通过掺杂痕量Ir改善ATO电极稳定性

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Antimony-doped tin oxide (ATO) thin films were prepared on titanium substrates using a thermal decomposition technique. Their stability improved by 9 times when doped with 0.1 mol percent of indium. A service life of 112 h was obtained under a current density of 1000 A/m~2 in 1 M H_2SO_4 solution. Cyclic voltammograms show that the Ir-doped ATO behaves similarly to conventional ATO with an ideal polarizable nature of the solid-electrolyte interface. Good linearity was observed for potential vs. logarithmic current density. The redox reaction of the [Fe(CN)_6] ~(3-)/[Fe(CN_)6] ~(4-) couple on the Ti/ATO electrode is nearly reversible.
机译:使用热分解技术在钛基板上制备了掺锑的氧化锡(ATO)薄膜。当掺入0.1mol%的铟时,它们的稳定性提高了9倍。在1 M H_2SO_4溶液中,电流密度为1000 A / m〜2时,使用寿命为112 h。循环伏安图表明,掺有Ir的ATO的行为类似于常规ATO,具有理想的固体电解质界面可极化性质。相对于对数电流密度,观察到良好的线性。 Ti / ATO电极上的[Fe(CN)_6]〜(3-)/ [Fe(CN_)6]〜(4-)对的氧化还原反应几乎是可逆的。

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