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Photocurrent enhancement in nanocrystalline-ZnO/Si heterojunction metal-semiconductor-metal photodetectors

机译:纳米ZnO / Si异质结金属-半导体-金属光电探测器中的光电流增强

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摘要

Nano-crystalline ZnO thin films have been deposited by radio frequency (RF) sputtering on Si substrates and used to fabricate metal-semiconductor-metal photodetectors (MSM-PDs). With this heterojunction structure and proper geometry of MSM interdigitated structure design, photocurrent enhancement has been accomplished. Both MSM-PDs using structures of ZnO-Si and ZnO/p-Si gave one to 2 orders higher magnitude photocurrent, respectively, than did the Si only structure. The higher than expected photocurrent has been achieved with n-ZnO/p-Si MSM-PDs showing photo to dark current ratio of 6310 and responsivity of 1.26 A/W. Avalanche multiplication in the ZnO layer is the main reason for improved photocurrent collection and spectral response enhancement in the UV range. Current transport was dominated by space charge limited current due to the nanocrystalline nature of the ZnO.
机译:纳米晶体ZnO薄膜已通过射频(RF)溅射沉积在Si衬底上,并用于制造金属-半导体-金属光电探测器(MSM-PD)。通过这种异质结结构和MSM叉指结构的适当几何形状,可以实现光电流增强。两种使用ZnO / n-Si和ZnO / p-Si结构的MSM-PD的光电流分别比仅使用Si的结构高1-2个数量级。 n-ZnO / p-Si MSM-PDs实现了高于预期的光电流,显示的光暗电流比为6310,响应度为1.26 A / W。 ZnO层中的雪崩倍增是在UV范围内改善光电流收集和增强光谱响应的主要原因。由于ZnO的纳米晶体性质,电流传输受到空间电荷限制电流的支配。

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