Supercritical Fluid Deposition of Conformal SrTiO_3 Films with Composition Uniformity in Nanocontact Holes

摘要

SrTiO_3 with a high dielectric constant is considered a promising capacitor dielectric for dynamic random access memory. Until now, a SrTiO_3 deposition with compositional uniformity and perfect conformality inside high-aspect nanoscale holes has been difficult by chemical vapor deposition (CVD) and atomic layer deposition (ALD). In this study, we report a supercritical fluid deposition (SCFD) of SrTiO_3. Compared to CVD SrTiO_3, the SCFD SrTiO_3 showed perfect conformality and compositional uniformity inside nanosize holes. From these results, the SCFD is expected to be a solution for the stoichiometry and conformality issues of the CVD and ALD SrTiO_3.