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Review-Multifunctional Technology with Monolithic Integrated THz-, Photonic- and mu-Fluidic Modules

机译:具有单片集成太赫兹,光子和μ流体模块的多功能审查技术

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The purpose of this work is to review requirements and challenges for the monolithic integration of different devices and modules in a baseline CMOS-process with the intention to create a multifunctional technology platform. We consider integrated modules like THz devices, i.e. complementary SiGe heterojunction bipolar transistors, silicon photonics components in particular Ge-PIN photo detectors and the wafer-level integration of micro-fluidic channels for sensor applications. However, the monolithic integration of devices and modules for novel functionalities is still a trade-off. On the one side there are requirements of the integration concept and therefore to the process steps of the dedicated module to achieve a maximum device performance. On the other side there are influences of the process steps for the module integration to the performance of the devices from the underlying baseline technology like bipolar-and CMOS-transistors or passive components. Both aspects have to be considered to enable the co-integration of new modules in order to get a technology platform for high performances and novel functionalities. We review process adaptations of the baseline technologies to enable an efficient co-integration of different modules. Moreover we discuss critical process steps with a certain thermal budget and their influence to device performances. Finally we give recommendations for process sequences to enable a wafer level co-integration of microfluidic channels into a SiGe-BiCMOS technology platform. (C) 2016 The Electrochemical Society. All rights reserved.
机译:这项工作的目的是回顾在基线CMOS工艺中不同设备和模块的单片集成的要求和挑战,以期创建一个多功能技术平台。我们考虑了诸如THz器件之类的集成模块,即互补的SiGe异质结双极晶体管,硅光子组件(特别是Ge-PIN光电探测器)以及用于传感器应用的微流体通道的晶圆级集成。然而,用于新颖功能的设备和模块的单片集成仍然是一个权衡。一方面,需要集成概念,因此需要专用模块的处理步骤,以实现最大的设备性能。另一方面,来自诸如双极和CMOS晶体管或无源组件之类的基础基准技术的模块集成处理步骤也会对设备的性能产生影响。必须考虑这两个方面,以实现新模块的协同集成,以便获得具有高性能和新颖功能的技术平台。我们审查了基准技术的过程适应性,以实现不同模块的有效集成。此外,我们讨论了具有一定热预算的关键工艺步骤及其对器件性能的影响。最后,我们提供了有关处理顺序的建议,以使微流体通道能够在晶圆级上共同集成到SiGe-BiCMOS技术平台中。 (C)2016年电化学学会。版权所有。

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